FDES 205 Computer-Aided Pattern Design I

3 credits, Spring

Focuses on developing competencies using computer-aided drafting and design (CADD) technology for producing patterns for apparel. Students learn digitizing, grading, pattern editing, pattern development, marker making, and plotting by employing pattern design software. Assignments include developing a variety of computer-generated patterns of original design for women's wear.

Prerequisite(s): A grade of "C" or better in FDES 201 or permission of instructor